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ISPD   2010 International Symposium on Physical Design
Wall of Fame | Most Viewed ISPD-2010 Paper
ISPD
2010
ACM
249views Hardware» more  ISPD 2010»
10 years 6 months ago
A matching based decomposer for double patterning lithography
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Yue Xu, Chris Chu
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