Sciweavers

Share
DATE
2009
IEEE

Analyzing the impact of process variations on parametric measurements: Novel models and applications

9 years 5 months ago
Analyzing the impact of process variations on parametric measurements: Novel models and applications
Abstract—In this paper we propose a novel statistical framework to model the impact of process variations on semiconductor circuits through the use of process sensitive test structures. Based on multivariate statistical assumptions, we propose the use of the expectation-maximization algorithm to estimate any missing test measurements and to calculate accurately the statistical parameters of the underlying multivariate distribution. We also propose novel techniques to validate our statistical assumptions and to identify any outliers in the measurements. Using the proposed model, we analyze the impact of the systematic and random sources of process variations to reveal their spatial structures. We utilize the proposed model to develop a novel application that significantly reduces the volume, time, and costs of the parametric test measurements procedure without compromising its accuracy. We extensively verify our models and results on measurements collected from more than 300 wafers a...
Sherief Reda, Sani R. Nassif
Added 20 May 2010
Updated 30 Aug 2010
Type Conference
Year 2009
Where DATE
Authors Sherief Reda, Sani R. Nassif
Comments (0)
books