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MVA
1994

Development of Surface Inspection Machine for Organic Photo Conductor(OPC)

13 years 5 months ago
Development of Surface Inspection Machine for Organic Photo Conductor(OPC)
The OPC is one of the most important component in the electrophotography process. So far its surface defects which degrade print quality were inspected by human-eye. We have developed the OPC surface inspection system employing an image processing technique. In this paper, we describe (1) an optical system to get the OPC surface image, (2) its analysis algorithm to specify the various defects and (3) the hardwarelsoftware implementation to reduce the processing time. As a result, the OPC Hillock defects is the most fatal defect of the inspection system was realized with high OPC, because it does not only degrade the print performance and flexibility. quality but also can cause the damages to other components. For the reason, it is important to detect the small hillock defects at the size of 0.1
Osamu Nakayama, Shinji Kobayashi, Katsuyuki Omura,
Added 02 Nov 2010
Updated 02 Nov 2010
Type Conference
Year 1994
Where MVA
Authors Osamu Nakayama, Shinji Kobayashi, Katsuyuki Omura, Takahiro Asai, Mitsuhiro Tomoda, Teruki Kamada
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