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IMECS
2007

A Genetic Algorithm for Optimizing Facility Layout in a Wafer Fab

13 years 6 months ago
A Genetic Algorithm for Optimizing Facility Layout in a Wafer Fab
—In this research, the Genetic Algorithm (GA) and Space-Filling Curve (SFC) are combined along with the use of Taguchi method for finding the optimal combination of parameters. The new algorithm has been tested on 12 cases of spine-type facility layout for four different material handling directions, e.g. clockwise one-way, two-way, clockwise one way with a shortcut and two-way with a shortcut to compare their cost differences. Results obtained in this research are analyzed and compared with those acquired using other algorithms. The efficiency of problem solving using this algorithm exceeds 96% and the optimal solution for a test case consisting of 20 bays is much superior to all other known optimal solutions.
Michael H. Hu, Meei-Yuh Ku, Chao-Chi Chen
Added 29 Oct 2010
Updated 29 Oct 2010
Type Conference
Year 2007
Where IMECS
Authors Michael H. Hu, Meei-Yuh Ku, Chao-Chi Chen
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