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2010

Layout Decomposition Approaches for Double Patterning Lithography

11 years 8 months ago
Layout Decomposition Approaches for Double Patterning Lithography
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different exposures) if their spacing is less than the minimum coloring spacing [7][12][15]. However, there exist pattern configurations for which pattern features separated by less than the minimum coloring spacing cannot be assigned different colors. In such cases, DPL requires that a layout feature be split into two parts. We address this problem using two layout decomposition approaches based on a conflict graph. First, node splitting is performed at all feasible dividing points. Then, one approach detects conflict cycles in the graph which are unresolvable for DPL coloring, and determines the coloring solution for the remaining nodes using integer linear programming (ILP). The other approach, based on a different ILP problem formulation, deletes some edges in the graph to make it two-colorable, then finds the colori...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya
Added 21 May 2011
Updated 21 May 2011
Type Journal
Year 2010
Where TCAD
Authors Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Yao
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