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ISQED
2007
IEEE

Modeling of PMOS NBTI Effect Considering Temperature Variation

13 years 10 months ago
Modeling of PMOS NBTI Effect Considering Temperature Variation
Negative bias temperature instability (NBTI) has come to the forefront of critical reliability phenomena in advanced CMOS technology. In this paper, we propose a fast and accurate PMOS NBTI model, in which the temperature variation and the ratio of active to standby time are considered in both stress and relaxation phases. A PMOS Vth degradation model and a digital circuits’ temporal performance degradation estimation method are developed based on our PMOS NBTI model. The simulation results show that: 1) our dynamic NBTI model without temperature variation is as accurate as previous models, the error is less than 2.3%; 2) the analysis error of PMOS Vth degradation may reach up to 52.6% without considering temperature variation; 3) for ISCAS85 benchmark circuits, the error of worst case performance degradation analysis is about on average 52.0%; 4) the ratio of active to standby time has a considerable impact during the performance degradation analysis.
Hong Luo, Yu Wang 0002, Ku He, Rong Luo, Huazhong
Added 04 Jun 2010
Updated 04 Jun 2010
Type Conference
Year 2007
Where ISQED
Authors Hong Luo, Yu Wang 0002, Ku He, Rong Luo, Huazhong Yang, Yuan Xie
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