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IWANN
1999
Springer

Pattern Recognition System with Top-Down Process of Mental Rotation

13 years 8 months ago
Pattern Recognition System with Top-Down Process of Mental Rotation
A new model which can recognize rotated, distorted, scaled, shifted and noised patterns is proposed. The model is constructed based on psychological experiments in a mental rotation. The model has two types of processes: (i) one is a bottom-up process in which pattern recognition is realized by means of a rotation-invariant neocognitron and a standard neocognitron and (ii) the other is a top-down process in which a mental rotation is executed by means of a model of associative recall in visual pattern recognition. In computer simulations, it is shown that the model can recognize rotated patterns without training those patterns. Keywords. rotation-invariant neocognitron, rotated pattern, mental rotation, topdown process, pattern recognition
Shunji Satoh, Hirotomo Aso, Shogo Miyake, Jousuke
Added 04 Aug 2010
Updated 04 Aug 2010
Type Conference
Year 1999
Where IWANN
Authors Shunji Satoh, Hirotomo Aso, Shogo Miyake, Jousuke Kuroiwa
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