34 search results - page 7 / 7 » A New Alternating Minimization Algorithm for Total Variation... |
ICCAD
2009
IEEE
13 years 2 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
VCIP
2000
13 years 6 months ago
2000
An alternative method to H.263 for encoding of moving images at bit rates below 64 kbit/s is presented using adaptive spatial subsampling, mesh based interpolation and node tracki...
SIAMIS
2011
12 years 11 months ago
2011
This article presents a new adaptive framework for locally parallel texture modeling. Oscillating patterns are modeled with functionals that constrain the local Fourier decompositi...
3DIM
2007
IEEE
13 years 11 months ago
2007
IEEE
In this paper, we present a new algorithm to reconstruct 3D surfaces from an unorganized point cloud based on generalizing the MPU implicit algorithm through introducing a powerfu...