870 search results - page 1 / 174 » A New Approach to Modeling and Solving Minimal Perturbation ... |
CSCLP
2003
Springer
13 years 11 months ago
2003
Springer
CP
2009
Springer
14 years 6 months ago
2009
Springer
Many problems require minimally perturbing an initial state in order to repair some violated constraints. We consider two search spaces for exactly solving this minimal perturbatio...
E4MAS
2005
Springer
13 years 11 months ago
2005
Springer
Abstract. Even if the multi-agent paradigm has been evolving for fifteen years, the development of concrete methods for problem solving remains a major challenge. This paper focus...
ICCAD
2009
IEEE
13 years 3 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
ANOR
2011
13 years 24 days ago
2011
This article deals with the resolution of over-constrained problems using constraint programming, which often imposes to add to the constraint network new side constraints. These ...