13 search results - page 3 / 3 » CMP-aware Maze Routing Algorithm for Yield Enhancement |
ICWMC
2006
IEEE
13 years 10 months ago
2006
IEEE
Geographic routing in wireless sensor networks is based on the prerequisite that every node has information about its current position, for instance via GPS or some localization a...
DAC
2006
ACM
14 years 5 months ago
2006
ACM
As the technology node advances into the nanometer era, via-open defects are one of the dominant failures. To improve via yield and reliability, redundant-via insertion is a highl...
ICCAD
2009
IEEE
13 years 2 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...