Previous works on buffer planning are mainly based on fixed die placement. It is necessary to reduce the complexity of computing the feasible buffer insertion sites to integrate t...
Yuchun Ma, Xianlong Hong, Sheqin Dong, Song Chen, ...
When VLSI technology scales toward 45nm, the lithography wavelength stays at 193nm. This large gap results in strong refractive effects in lithography. Consequently, it is a huge...
We present in this paper a multilevel floorplanning/placement framework based on the B*-tree representation, called MB*-tree, to handle the floorplanning and packing for large-sca...
This paper presents a new power saving, high speed FPGA design enhancing a previous SiGe CML FPGA based on the Xilinx 6200 FPGA. The design aims at having a higher performance but...
Jong-Ru Guo, Chao You, Kuan Zhou, Bryan S. Goda, R...
— Starting at the 65nm node, stress engineering to improve performance of transistors has been a major industry focus. An intrinsic stress source – shallow trench isolation –...
Andrew B. Kahng, Puneet Sharma, Rasit Onur Topalog...