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ICIP
2008
IEEE
9 years 5 months ago
Inverse image problem of designing phase shifting masks in optical lithography
The continual shrinkage of minimum feature size in integrated circuit (IC) fabrication incurs more and more serious distortion in the optical lithography process, generating circu...
Stanley H. Chan, Edmund Y. Lam
ICIP
2010
IEEE
8 years 1 months ago
Stochastic gradient descent for robust inverse photomask synthesis in optical lithography
Optical lithography is a critical step in the semiconductor manufacturing process, and one key problem is the design of the photomask for a particular circuit pattern, given the o...
Ningning Jia, Edmund Y. Lam
DAC
2003
ACM
9 years 4 months ago
A cost-driven lithographic correction methodology based on off-the-shelf sizing tools
As minimum feature sizes continue to shrink, patterned features have become significantly smaller than the wavelength of light used in optical lithography. As a result, the requir...
Puneet Gupta, Andrew B. Kahng, Dennis Sylvester, J...
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