3 search results - page 1 / 1 » Inverse image problem of designing phase shifting masks in o... |
ICIP
2008
IEEE
14 years 6 months ago
2008
IEEE
The continual shrinkage of minimum feature size in integrated circuit (IC) fabrication incurs more and more serious distortion in the optical lithography process, generating circu...
ICIP
2010
IEEE
13 years 2 months ago
2010
IEEE
Optical lithography is a critical step in the semiconductor manufacturing process, and one key problem is the design of the photomask for a particular circuit pattern, given the o...
DAC
2003
ACM
14 years 5 months ago
2003
ACM
As minimum feature sizes continue to shrink, patterned features have become significantly smaller than the wavelength of light used in optical lithography. As a result, the requir...