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» Layout decomposition for double patterning lithography

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ISPD
2009
ACM

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Double patterning layout decomposition for simultaneous conflict and stitch minimization

14 years 10 days ago

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Kun Yuan, Jae-Seok Yang, David Z. Pan

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ICCAD
2009
IEEE

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GREMA: Graph reduction based efficient mask assignment for double patterning technology

13 years 3 months ago

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Double patterning technology (DPT) has emerged as the most hopeful candidate for the next technology node of the ITRS roadmap [1]. The goal of a DPT decomposer is to decompose the...

Yue Xu, Chris Chu

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