6 search results - page 1 / 2 » Optical proximity correction (OPC): friendly maze routing |
DAC
2004
ACM
13 years 10 months ago
2004
ACM
As the technology migrates into the deep submicron manufacturing (DSM) era, the critical dimension of the circuits is getting smaller than the lithographic wavelength. The unavoid...
ICCAD
2007
IEEE
14 years 1 months ago
2007
IEEE
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
ASPDAC
2005
ACM
13 years 10 months ago
2005
ACM
To handle modern routing with nanometer effects, we need to consider designs of variable wire widths and spacings, for which gridless routers are desirable due to their great fle...
DAC
2005
ACM
14 years 5 months ago
2005
ACM
While performance specifications are verified before sign-off for a modern nanometer scale design, extensive application of optical proximity correction substantially alters the l...
DAC
2008
ACM
14 years 5 months ago
2008
ACM
In this paper, we present ELIAD, an efficient lithography aware detailed router to optimize silicon image after optical proximity correction (OPC) in a correct-by-construction man...