—Designing rotational symmetry fields on surfaces is an important task for a wide range of graphics applications. This work introduces a rigorous and practical approach for auto...
Yu-Kun Lai, Miao Jin, Xuexiang Xie, Ying He 0001, ...
With the adoption of ultra regular fabric paradigms for controlling design printability at the 22nm node and beyond, there is an emerging need for a layout-driven, pattern-based p...
Tarek A. El-Moselhy, Ibrahim M. Elfadel, Luca Dani...