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    DAC
    2009
    ACM
    192views Computer Architecture» more  DAC 2009»
    Double patterning lithography friendly detailed routing with redundant via consideration
    14 years 5 months ago
    Double patterning lithography friendly detailed routing with redundant via consideration
    Download  www.cerc.utexas.edu
    In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
    Kun Yuan, Katrina Lu, David Z. Pan
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