ISPD
2007
ACM
13 years 6 months ago
2007
ACM
When VLSI technology scales toward 45nm, the lithography wavelength stays at 193nm. This large gap results in strong refractive effects in lithography. Consequently, it is a huge...
VLSID
1996
IEEE
13 years 8 months ago
1996
IEEE
Simulated annealing based standard cell placement for VLSI designs has long been acknowledged as a compute-intensive process, and as a result several research efforts have been un...
ISPD
2005
ACM
13 years 10 months ago
2005
ACM
In this invited note we describe Capo, an open-source software tool for cell placement, mixed-size placement and floorplanning with emphasis on routability. Capo is among the fas...
ISQED
2006
IEEE
13 years 10 months ago
2006
IEEE
— With advanced VLSI manufacturing technology in deep submicron (DSM) regime, we can integrate entire electronic systems on a single chip (SoC). Due to the complexity in SoC desi...