DAC
2000
ACM
13 years 9 months ago
2000
ACM
DAC
2000
ACM
13 years 9 months ago
2000
ACM
DAC
2000
ACM
13 years 9 months ago
2000
ACM
DAC
2000
ACM
13 years 9 months ago
2000
ACM
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
DAC
2000
ACM
13 years 9 months ago
2000
ACM
This paper develops the noise-counterparts to familiar delay formulas like Elmore or PRIMO. By matching the first few moments of the network’s transfer impedance, we obtain effi...
DAC
2000
ACM
13 years 9 months ago
2000
ACM
This paper presents an automated, layout-aware RF LCoscillator design tool, called CYCLONE that delivers an accurate and optimal LC-oscillator design, from specification to layout...
DAC
2000
ACM
13 years 9 months ago
2000
ACM
DAC
2000
ACM
13 years 9 months ago
2000
ACM
The ordered tree (O-tree) representation has recently gained much interest in layout design automation. Different from previous topological representations of non-slicing floorpl...
DAC
2000
ACM
13 years 9 months ago
2000
ACM
Datapath design is one of the most critical elements in the design of a high performance microprocessor. However datapath design is typically done manually, and is often custom st...
DAC
2000
ACM
13 years 9 months ago
2000
ACM
The decrease in feature size and added chip functionality in large sub-micron integrated circuits demand larger grids for power distribution. Since power grids are performance lim...