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TCAD
2008
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13 years 4 months ago
Full-Chip Routing Considering Double-Via Insertion
As the technology node advances into the nanometer era, via-open defects are one of the dominant failures due to the copper cladding process. To improve via yield and reliability, ...
Huang-Yu Chen, Mei-Fang Chiang, Yao-Wen Chang, Lum...