Sciweavers

ICCD
2007
IEEE
111views Hardware» more  ICCD 2007»
14 years 1 months ago
On modeling impact of sub-wavelength lithography on transistors
As the VLSI technology marches beyond 65 and 45nm process technologies, variation in gate length has a direct impact on leakage and performance of CMOS transistors. Due to sub-wav...
Aswin Sreedhar, Sandip Kundu