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    Layout Decomposition Approaches for Double Patterning Lithography
    12 years 11 months ago
    Layout Decomposition Approaches for Double Patterning Lithography
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    Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
    Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
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