ISVLSI
2007
IEEE
13 years 10 months ago
2007
IEEE
— Chemical-Mechanical Polishing (CMP) is one of the key steps during nanometer VLSI manufacturing process where minimum variation of layout pattern densities is desired. This pap...
ISVLSI
2007
IEEE
13 years 10 months ago
2007
IEEE
Designing high-performance low-power register files is of critical importance to the continuation of current performance advances in wide-issue and deeply-pipelined superscalar m...
ISVLSI
2007
IEEE
13 years 10 months ago
2007
IEEE
— Y -interconnects for VLSI chips are based on the use of global and semi-global wiring in only 0◦ , 60◦ , and 120◦ . Though X-interconnects are fast replacing the traditio...
ISVLSI
2007
IEEE
13 years 10 months ago
2007
IEEE
In this paper, we propose and implement a vector processing system that includes two identical vector microprocessors embedded in two FPGA chips. Each vector microprocessor suppor...
ISVLSI
2007
IEEE
13 years 10 months ago
2007
IEEE
Formal verification has become an important step in circuit and system design. A prominent technique is Bounded Model Checking (BMC) which is widely used in industry. In BMC it i...
ISVLSI
2007
IEEE
13 years 10 months ago
2007
IEEE
As power consumption of the clock tree dominates over 40% of the total power in modern high performance VLSI designs, measures must be taken to keep it under control. One of the m...
ISVLSI
2007
IEEE
13 years 10 months ago
2007
IEEE
Although RTL power macromodeling is a mature research topic, it is not yet broadly accepted in the industrial environment. One of the main reasons impairing its widespread use as ...
ISVLSI
2007
IEEE
13 years 10 months ago
2007
IEEE
In sub-90nm technologies, more frequent hard faults pose a serious burden on processor design and yield control. In addition to manufacturing-time chip repair schemes, microarchit...
ISVLSI
2007
IEEE
13 years 10 months ago
2007
IEEE
Performance, power, and functionality, yield and manufacturability are rapidly becoming additional critical factors that must be considered at higher levels of ion. A possible sol...
ISVLSI
2007
IEEE
13 years 10 months ago
2007
IEEE
As technology scales, more sophisticated fabrication processes cause variations in many different parameters in the device. These variations could severely affect the performance ...