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    ICCAD
    2008
    IEEE
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    Layout decomposition for double patterning lithography
    14 years 1 months ago
    Layout decomposition for double patterning lithography
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    In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different exposures)...
    Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
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