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DAC
2003
ACM
9 years 5 months ago
A cost-driven lithographic correction methodology based on off-the-shelf sizing tools
As minimum feature sizes continue to shrink, patterned features have become significantly smaller than the wavelength of light used in optical lithography. As a result, the requir...
Puneet Gupta, Andrew B. Kahng, Dennis Sylvester, J...
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