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ISQED
2007
IEEE
156views Hardware» more  ISQED 2007»
8 years 10 months ago
A New Method of Implementing Hierarchical OPC
For emerging deep-subwavelength lithography technologies (90 nm and following) the data volume and the complexity of Optical Proximity Correction (OPC) have increased dramatically...
Yufu Zhang, Zheng Shi
DAC
2003
ACM
9 years 5 months ago
A cost-driven lithographic correction methodology based on off-the-shelf sizing tools
As minimum feature sizes continue to shrink, patterned features have become significantly smaller than the wavelength of light used in optical lithography. As a result, the requir...
Puneet Gupta, Andrew B. Kahng, Dennis Sylvester, J...
DAC
1999
ACM
9 years 5 months ago
Subwavelength Lithography and Its Potential Impact on Design and EDA
This tutorial paper surveys the potential implications of subwavelength optical lithography for new tools and flows in the interface between layout design and manufacturability. W...
Andrew B. Kahng, Y. C. Pati
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