ISQED
2007
IEEE
13 years 10 months ago
2007
IEEE
For emerging deep-subwavelength lithography technologies (90 nm and following) the data volume and the complexity of Optical Proximity Correction (OPC) have increased dramatically...
DAC
2003
ACM
14 years 5 months ago
2003
ACM
As minimum feature sizes continue to shrink, patterned features have become significantly smaller than the wavelength of light used in optical lithography. As a result, the requir...
DAC
1999
ACM
14 years 5 months ago
1999
ACM
This tutorial paper surveys the potential implications of subwavelength optical lithography for new tools and flows in the interface between layout design and manufacturability. W...