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ENGL
2008
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9 years 2 months ago
Two-stage Atomic Layer Deposition of Smooth Aluminum Oxide on Hydrophobic Self-assembled Monolayers
We describe the growth of aluminum oxide (AlOx) on strong hydrophobic surfaces that consist of CH3-terminated self-assembled monolayers (CH3-SAMs) by utilizing atomic layer deposit...
Nobuhiko P. Kobayashi, R. Stanley Williams
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