VLSI
2007
Springer
13 years 10 months ago
2007
Springer
Abstract—Analysis and verification environments for nextgeneration nano-scale RFIC designs must be able to cope with increasing design complexity and to account for new effects,...
FPGA
2007
ACM
13 years 10 months ago
2007
ACM
Chip design in the nanometer regime is becoming increasingly difficult due to process variations. ASIC designers have adopted statistical optimization techniques to mitigate the e...
MICRO
2007
IEEE
13 years 10 months ago
2007
IEEE
Process variations will greatly impact the stability, leakage power consumption, and performance of future microprocessors. These variations are especially detrimental to 6T SRAM ...
ISVLSI
2007
IEEE
13 years 10 months ago
2007
IEEE
As technology scales, more sophisticated fabrication processes cause variations in many different parameters in the device. These variations could severely affect the performance ...
ISQED
2007
IEEE
13 years 10 months ago
2007
IEEE
In nanometer regime, the effects of variations are having an increasing impact on the delay and power characteristics of devices as well as the yield of the circuit. Statistical t...
ISCAS
2007
IEEE
13 years 10 months ago
2007
IEEE
—Component tolerances and mismatches due to process variations severely degrade the performance of bandgap reference (BGR) circuits. In this paper, we describe the design of a BG...
ISCAS
2007
IEEE
13 years 10 months ago
2007
IEEE
— A receiving signal strength indicator (RSSI) built with transconductance amplifiers is presented. The RSSI achieves high tolerance to process variations by utilizing the unique...
ISCAS
2008
IEEE
13 years 11 months ago
2008
IEEE
— In a nanoscale technology, memory bits are highly susceptible to process variation induced read/write failures. To address the above problem, in this paper a new memory cell is...
ISCA
2008
IEEE
13 years 11 months ago
2008
IEEE
Process variations are poised to significantly degrade performance benefits sought by moving to the next nanoscale technology node. Parameter fluctuations in devices can introd...
ICCAD
2008
IEEE
13 years 11 months ago
2008
IEEE
— As technology scales to 45nm and below, process variations will present significant impact on path delay. This trend makes the deviation between simulated path delay and actua...