This paper describes a new collaboration technology that is based on the support of lightweight, informally structured, opportunistic activities featuring heterogeneous threads of...
David R. Millen, Michael J. Muller, Werner Geyer, ...
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
The design of Adaptive Hypermedia is a difficult task which can be made easier if generic systems and AH creators' models are reused. We address this design problem in the set...
This paper proposes debug patterns combined with an intuitive flow to accelerate and simplify the debugging of SystemC designs. A debug pattern provides a formalized procedure to f...
Frank Rogin, Erhard Fehlauer, Christian Haufe, Seb...
Combining expressiveness and plainness in the design of web documents is a difficult task. Validation languages are very powerful and designers are tempted to over-design specific...
Antonina Dattolo, Angelo Di Iorio, Silvia Duca, An...