4650 search results - page 621 / 930 » Generating and evaluating evaluative arguments |
142
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ICCAD
2008
IEEE
16 years 2 months ago
2008
IEEE
In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different exposures)...
159
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ICCAD
2004
IEEE
16 years 2 months ago
2004
IEEE
While process variations are becoming more significant with each new IC technology generation, they are often modeled via linear regression models so that the resulting performanc...
158
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IUI
2009
ACM
16 years 2 months ago
2009
ACM
Using content-specific models to guide information retrieval and extraction can provide richer interfaces to endusers for both understanding the context of news events and navigat...
151
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CVPR
2010
IEEE
16 years 1 months ago
2010
IEEE
This paper presents a sparse representation of 2D planar shape through the composition of warping functions, termed formlets, localized in scale and space. Each formlet subjects t...
175
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CVPR
2010
IEEE
16 years 1 months ago
2010
IEEE
This paper presents a new approach for multi-view object class detection. Appearance and geometry are treated as separate learning tasks with different training data. Our approach...