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2008

Two-stage Atomic Layer Deposition of Smooth Aluminum Oxide on Hydrophobic Self-assembled Monolayers

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Two-stage Atomic Layer Deposition of Smooth Aluminum Oxide on Hydrophobic Self-assembled Monolayers
We describe the growth of aluminum oxide (AlOx) on strong hydrophobic surfaces that consist of CH3-terminated self-assembled monolayers (CH3-SAMs) by utilizing atomic layer deposition (ALD) with H2O as the oxygen source. The evolution of AlOx on the CH3-SAMs was studied by comparing with that on hydrophilic OH-terminated silicon dioxide (OH-SiO2). The AlOx grown on the CH3-SAM surfaces underwent growth instability and developed significantly rough surface morphologies while the AlOx on the OH-SiO2 maintained atomically smooth surface morphologies. The structural integrity of the CH3-SAMs was also found to be disturbed substantially at the onset of the ALD process with H2O. In order to improve the surface morphology of AlOx on CH3-SAM surfaces, a two-stage ALD process was developed. In the two-stage ALD process for AlOx, the first stage utilized n-propanol as the oxygen source and the second stage proceeded with H2O. The optimized two-stage ALD process significantly improved the surface...
Nobuhiko P. Kobayashi, R. Stanley Williams
Added 10 Dec 2010
Updated 10 Dec 2010
Type Journal
Year 2008
Where ENGL
Authors Nobuhiko P. Kobayashi, R. Stanley Williams
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