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» A sensitivity based placer for standard cells
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ISPD
2007
ACM
151views Hardware» more  ISPD 2007»
13 years 6 months ago
Pattern sensitive placement for manufacturability
When VLSI technology scales toward 45nm, the lithography wavelength stays at 193nm. This large gap results in strong refractive effects in lithography. Consequently, it is a huge...
Shiyan Hu, Jiang Hu
VLSID
2002
IEEE
119views VLSI» more  VLSID 2002»
14 years 5 months ago
Reducing Library Development Cycle Time through an Optimum Layout Create Flow
One of the major roadblocks in reduction of library generation cycle time is the layout generation phase. The two methods of doing automatic layout generation are synthesis and mig...
Rituparna Mandal, Dibyendu Goswami, Arup Dash
ISMB
2000
13 years 6 months ago
Analysis of Gene Expression Microarrays for Phenotype Classification
Several microarray technologies that monitor the level of expression of a large number of genes have recently emerged. Given DNA-microarray data for a set of cells characterized b...
Andrea Califano, Gustavo Stolovitzky, Yuhai Tu
ISBI
2008
IEEE
14 years 6 months ago
Phase contrast image segmentation by weak watershed transform assembly
We present here a method giving a robust segmentation for in vitro cells observed under standard phase-contrast microscopy. We tackle the problem using the watershed transform. Wa...
Olivier Debeir, Ivan Adanja, Nadine Warzée,...
BMCBI
2011
12 years 9 months ago
Faster Smith-Waterman database searches with inter-sequence SIMD parallelisation
Background: The Smith-Waterman algorithm for local sequence alignment is more sensitive than heuristic methods for database searching, but also more time-consuming. The fastest ap...
Torbjørn Rognes