28 search results - page 6 / 6 » An Enhanced Multilevel Algorithm for Circuit Placement |
DAC
2008
ACM
14 years 6 months ago
2008
ACM
In this paper, we present ELIAD, an efficient lithography aware detailed router to optimize silicon image after optical proximity correction (OPC) in a correct-by-construction man...
DAC
2006
ACM
14 years 6 months ago
2006
ACM
As the technology node advances into the nanometer era, via-open defects are one of the dominant failures. To improve via yield and reliability, redundant-via insertion is a highl...
DAC
2004
ACM
14 years 6 months ago
2004
ACM
Resolution enhancement techniques (RET) such as optical proximity correction (OPC) and phase-shift mask (PSM) technology are deployed in modern processes to increase the fidelity ...