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DAC
2008
ACM
14 years 5 months ago
ELIAD: efficient lithography aware detailed router with compact post-OPC printability prediction
In this paper, we present ELIAD, an efficient lithography aware detailed router to optimize silicon image after optical proximity correction (OPC) in a correct-by-construction man...
Minsik Cho, Kun Yuan, Yongchan Ban, David Z. Pan