194 search results - page 39 / 39 » Conflict Resolution |
AAAI
2008
13 years 7 months ago
2008
The goal of my ongoing work is to provide an architecture for developing and manipulating modular ontologies in such a way that each ontology module can plug into or unplug from a...
IEEEARES
2010
IEEE
13 years 12 months ago
2010
IEEE
—Managing access control policies is a complex task. We argue that much of the complexity is unnecessary and mostly due to historical reasons. There are number of legacy policy s...
SCA
2007
13 years 7 months ago
2007
Although mesh-based methods are efficient for simulating simple hyperelasticity, maintaining and adapting a mesh-based representation is less appealing in more complex scenarios, ...
ICCAD
2009
IEEE
13 years 2 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...