26 search results - page 5 / 6 » Distributed Node Coloring in the SINR Model |
TRIDENTCOM
2005
IEEE
13 years 11 months ago
2005
IEEE
To facilitate a broad range of experimental research on novel protocols and application concepts, we employ an indoor wireless testbed to emulate the performance of the real-world...
ICCAD
2009
IEEE
13 years 3 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
ASPDAC
2009
ACM
14 years 8 days ago
2009
ACM
Abstract— Double patterning lithography (DPL) is in current production for memory products, and is widely viewed as inevitable for logic products at the 32nm node. DPL decomposes...
GLOBECOM
2008
IEEE
14 years 6 days ago
2008
IEEE
—Immediate notification of urgent but rare events and delivery of time sensitive actuation commands appear in many practical wireless sensor and actuator network applications. M...
SENSYS
2006
ACM
13 years 11 months ago
2006
ACM
From experience with wireless sensor networks it has become apparent that dynamic reprogramming of the sensor nodes is a useful feature. The resource constraints in terms of energ...