This paper studies impact of the well edge proximity effect on digital circuit delay, based on model parameters extracted from test structures in an industrial 65nm wafer process. ...
— Modern advances in reconfigurable analog technologies are allowing field-programmable analog arrays (FPAAs) to dramatically grow in size, flexibility, and usefulness. This p...
I. Faik Baskaya, Brian Gestner, Christopher M. Twi...
In this paper, we investigate the impact of interconnect and device process variations on voltage fluctuations in power grids. We consider random variations in the power grid’s...
Praveen Ghanta, Sarma B. K. Vrudhula, Rajendran Pa...
We propose a new metric for evaluation of interconnect architectures. This metric is computed by optimal assignment of wires from a given wire length distribution (WLD) to a given...
Parthasarathi Dasgupta, Andrew B. Kahng, Swamy Mud...
The ability to account for the growing impacts of multiple process variations in modern technologies is becoming an integral part of nanometer VLSI design. Under the context of ti...