This paper presents figures of merit and error formulae to determine which interconnects require volume discretization in the GHZ range. Most of the previous work focused mainly o...
Double patterning lithography seems to be a prominent choice for 32nm and 22nm technologies. Double patterning lithography techniques require additional masks for a single interco...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
This paper presents an efficient approach to perform global interconnect sizing and spacing (GISS) for multiple nets to minimize interconnect delays with consideration of couplin...
Jason Cong, Lei He, Cheng-Kok Koh, David Zhigang P...
We propose a novel solid/fluid coupling method that treats the coupled system in a fully implicit manner making it stable for arbitrary time steps, large density ratios, etc. In c...
Avi Robinson-Mosher, Tamar Shinar, Jon Gretarsson,...
The present study treats the calculation of the continuous phase of a multiphase flow, i.e. the numerical solution of the equations for a turbulent incompressible flow. An exist...
Klaus Bernert, Thomas Frank, Hellfried Schneider, ...