: In agile software development refactoring is an important phase for the continuous improvement of software quality. Unfortunately, the application of refactorings is very subject...
Background: Microarray measurements are susceptible to a variety of experimental artifacts, some of which give rise to systematic biases that are spatially dependent in a unique w...
High-Seng Chai, Terry M. Therneau, Kent R. Bailey,...
When VLSI technology scales toward 45nm, the lithography wavelength stays at 193nm. This large gap results in strong refractive effects in lithography. Consequently, it is a huge...
In this paper, we propose to apply artifact mining in a global development environment to support measurement based process management and improvement, such as SEI/CMMI’s GQ(I)M...
The primary focus of this project is to design and implement a parallel framework for an unstructured mesh generator based on the advancing front method (AFM). In particular, we t...