13 search results - page 3 / 3 » Layered participatory analysis: new developments in the CARD... |
ISQED
2010
IEEE
13 years 11 months ago
2010
IEEE
—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
ICCAD
1997
IEEE
13 years 9 months ago
1997
IEEE
Abstract — The principles employed in the development of modern RF simulators are introduced and the various techniques currently in use, or expected to be in use in the next few...
TVCG
2010
13 years 3 months ago
2010
— While a number of information visualization software frameworks exist, creating new visualizations, especially those that involve novel visualization metaphors, interaction tec...