19 search results - page 3 / 4 » Layout Decomposition Approaches for Double Patterning Lithog... |
TVLSI
2010
12 years 12 months ago
2010
The gap between VLSI technology and fabrication technology leads to strong refractive effects in lithography. Consequently, it is a huge challenge to reliably print layout features...
ISPD
2009
ACM
13 years 12 months ago
2009
ACM
ISPD
2007
ACM
13 years 6 months ago
2007
ACM
When VLSI technology scales toward 45nm, the lithography wavelength stays at 193nm. This large gap results in strong refractive effects in lithography. Consequently, it is a huge...
ICIP
2008
IEEE
14 years 6 months ago
2008
IEEE
The continual shrinkage of minimum feature size in integrated circuit (IC) fabrication incurs more and more serious distortion in the optical lithography process, generating circu...
ICCAD
2009
IEEE
13 years 2 months ago
2009
IEEE
Double patterning technology (DPT) has emerged as the most hopeful candidate for the next technology node of the ITRS roadmap [1]. The goal of a DPT decomposer is to decompose the...