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2008
IEEE
118views Hardware» more  DATE 2008»
13 years 6 months ago
Layout Level Timing Optimization by Leveraging Active Area Dependent Mobility of Strained-Silicon Devices
Advanced MOSFETs such as Strained Silicon (SS) devices have emerged as critical enablers to keep Moore's law on track for sub100nm technologies. Use of Strained Silicon devic...
Ashutosh Chakraborty, Sean X. Shi, David Z. Pan
TCAD
2010
88views more  TCAD 2010»
12 years 11 months ago
Stress Aware Layout Optimization Leveraging Active Area Dependent Mobility Enhancement
Starting from the 90nm technology node, process induced stress has played a key role in the design of highperformance devices. The emergence of source/drain silicon germanium (S/D ...
Ashutosh Chakraborty, Sean X. Shi, David Z. Pan