TCAD 2010 - PDF Preprint Papers

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2010

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Layout Decomposition Approaches for Double Patterning Lithography

12 years 11 months ago

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Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...

Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...

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