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DAC
2000
ACM
13 years 10 months ago
Model-based dummy feature placement for oxide chemical-mechanical polishing manufacturability
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
Ruiqi Tian, D. F. Wong, Robert Boone
HEURISTICS
2002
99views more  HEURISTICS 2002»
13 years 5 months ago
Parallelizing Tabu Search on a Cluster of Heterogeneous Workstations
In this paper, we present the parallelization of tabu search on a network of workstations using PVM. Two parallelization strategies are integrated: functional decomposition strate...
Ahmad A. Al-Yamani, Sadiq M. Sait, Habib Youssef, ...
CP
2009
Springer
14 years 16 days ago
Pin Assignment Using Stochastic Local Search Constraint Programming
Abstract. VLSI chips design is becoming increasingly complex and calling for more and more automation. Many chip design problems can be formulated naturally as constraint problems ...
Bella Dubrov, Haggai Eran, Ari Freund, Edward F. M...
DATE
2002
IEEE
91views Hardware» more  DATE 2002»
13 years 10 months ago
An Enhanced Q-Sequence Augmented with Empty-Room-Insertion and Parenthesis Trees
After the discussion on the difference between floorplanning and packing in VLSI placement design, this paper adapts the floorplanner that is based on the Q-sequence to a packin...
Changwen Zhuang, Yoji Kajitani, Keishi Sakanushi, ...
GLVLSI
2009
IEEE
125views VLSI» more  GLVLSI 2009»
14 years 14 days ago
Redundant wire insertion for yield improvement
Based on the insertion of internal and external redundant wires into L-type and U-type wires, an efficient two-phase reliability-driven insertion algorithm is proposed to insert r...
Jin-Tai Yan, Zhi-Wei Chen