18 search results - page 1 / 4 » Performance Driven OPC for Mask Cost Reduction |
ISQED
2005
IEEE
13 years 10 months ago
2005
IEEE
With continued aggressive process scaling in the subwavelength lithographic regime, resolution enhancement techniques (RETs) such as optical proximity correction (OPC) are an inte...
DAC
2004
ACM
14 years 5 months ago
2004
ACM
Resolution enhancement techniques (RET) such as optical proximity correction (OPC) and phase-shift mask (PSM) technology are deployed in modern processes to increase the fidelity ...
DAC
2003
ACM
14 years 5 months ago
2003
ACM
As minimum feature sizes continue to shrink, patterned features have become significantly smaller than the wavelength of light used in optical lithography. As a result, the requir...
TCAD
2010
12 years 11 months ago
2010
In recent years, structured application-specific integrated circuit (ASIC) design style has lessened the importance of mask cost. Multiple structured ASIC chip designs share the sa...
FPL
2003
Springer
13 years 10 months ago
2003
Springer
In this paper we propose a design space exploration method targeting reconfigurable architectures that takes place at the algorithmic level and aims to rapidly highlight architect...