Abstract— As VLSI technology enters the nanoscale regime, interconnect delay becomes the bottleneck of circuit performance. Compared to gate delays, wires are becoming increasing...
Abstract— Deep submicron technology scaling has two major ramifications on the design process. First, reduced feature size significantly increases wire delay, thus resulting in...
In high-speed digital VLSI design, bounding the load capacitance at gate outputs is a well-known methodology to improve coupling noise immunity, reduce degradation of signal trans...
Charles J. Alpert, Andrew B. Kahng, Bao Liu, Ion I...
SoC design methodologies are under constant revision due to adoption of fast shrinking process technologies at nanometer levels. Nanometer process geometries exhibit new complex d...
R. Raghavendra Kumar, Ricky Bedi, Ramadas Rajagopa...
In the context of physical synthesis, large-scale standard-cell placement algorithms must facilitate incremental changes to layout, both local and global. In particular, flexible ...
Saurabh N. Adya, Igor L. Markov, Paul G. Villarrub...