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ISQED
2003
IEEE
13 years 10 months ago
2003
IEEE
The importance of an interconnect pattern density model in ASIC design flow for a 90nm technology is presented. It is shown that performing the timing analysis at the worst-case c...
ISQED
2003
IEEE
13 years 10 months ago
2003
IEEE
Approach Abstracts AltPSM Lithography Requirements for sub-100nm IC Design Domains Pradiptya Ghosh, Chung-shin Kang, Michael Sanie and David Pinto Numerical Technologies, 70 West P...