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ISCAS
2006
IEEE
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ISCAS 2006
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A character size optimization technique for throughput enhancement of character projection lithography
13 years 11 months ago
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www.emb.ics.tut.ac.jp
— We propose a character size optimization technique to enhance the throughput of maskless lithography as well as photomask manufacture. The number of electron beam shots to draw...
Makoto Sugihara, Taiga Takata, Kenta Nakamura, Ryo...
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