Sciweavers

ICCAD
2007
IEEE
129views Hardware» more  ICCAD 2007»
14 years 1 months ago
A novel intensity based optical proximity correction algorithm with speedup in lithography simulation
Abstract—It is important to reduce the Optical Proximity Correction (OPC) runtime while maintaining a good result quality. In this paper, we obtain a better formula, which theore...
Peng Yu, David Z. Pan