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    SLIP
    2009
    ACM
    175views Computer Networks» more  SLIP 2009»
    Is overlay error more important than interconnect variations in double patterning?
    13 years 11 months ago
    Is overlay error more important than interconnect variations in double patterning?
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    Double patterning lithography seems to be a prominent choice for 32nm and 22nm technologies. Double patterning lithography techniques require additional masks for a single interco...
    Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
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